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Oxford Instruments

Plasmalab 100 ICP 180 RIE

EtchOxford Instruments Plasmalab 100 family
Research Quality: 50% complete
Plasmalab 100 ICP 180 RIE — Inventory photo
Fig. 01Plasmalab 100 ICP 180 RIEInventory photo[1]
  • Plate 01Video 1 Oxford Plasmalab 100 ICP System ID# 3589

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  • Plate 02Oxford Plasmalab 100 ICP (ID# 4162)

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  • Plate 03Oxford Plasmalab 100 ICP Etcher (ID# 3811)

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  • Plate 04Oxford Plasmalab 100 ICP (ID# 3894)

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Power

208V, 50/60Hz[1]

Vacuum

With VAT PM-5 Adaptive Pressure Controller[1]

Gas delivery

Gas Box[1]

What it is

The specific model is configured to process six-inch wafers and operates on a 208V, 50/60Hz electrical supply. The system includes a VAT PM-5 adaptive pressure controller, an Adixen ACT 1300M turbopump controller, a Leybold D65BCS vacuum pump, a gas box, two chillers (Thermo Neslab and OptiTemp OTI-5WL-P3-216), a control computer (without a hard disk drive), an LCD monitor, and a computer cart.[1][2]

How it works

The Plasmalab 100 ICP 180 RIE incorporates a VAT PM-5 adaptive pressure controller for precise regulation of process chamber pressure. Vacuum is maintained by an Adixen ACT 1300M turbopump controller backed by a Leybold D65BCS vacuum pump. Process gases are delivered through an integrated gas box.[1][2]

Where it fits in the process flow

General reference — not yet source-verified

Reactive ion etchers are typically placed in a semiconductor fab after the lithography step, where they transfer photoresist patterns into underlying layers of material. The etched features are then followed by resist stripping, inspection, and subsequent deposition or processing steps.

Applications

The Plasmalab 100 ICP 180 RIE, with its bundled chillers and dedicated control system, is suited for processes that demand stable temperature and repeatable pressure control. The system includes both NESLAB and OptiTemp chillers to maintain wafer or electrode temperature during etching.[1][2]

What do the numbers mean?

Power & electrical2

Voltage
208V, 50/60Hz[1]
Accurate?
Power
208V, 50/60Hz[1]
Accurate?

Vacuum & pumping6

With VAT PM-5 Adaptive Pressure Controller[1]
Accurate?
Adixen ACT 1300M Turbopump Controller[1]
Accurate?
Leybold D65BCS Vacuum Pump with Oil Filter & Exhaust Filter[1]
Accurate?
Adaptive pressure controller
VAT PM-5[1]
Accurate?
Turbopump controller
Adixen ACT 1300M[1]
Accurate?
Vacuum pump
Leybold D65BCS with oil filter and exhaust filter[1]
Accurate?

Wafer handling1

Wafer size
6 inch[1]
Accurate?

Gas & chemistry2

Gas Box[1]
Accurate?
Gas delivery
Gas Box[1]
Accurate?

Control & software4

Control Computer (no HDD)[1]
Accurate?
Computer Cart[1]
Accurate?
Control computer
Control Computer (no HDD)[1]
Accurate?
Computer cart
Computer Cart[1]
Accurate?

Configuration & options11

Includes:[1]
Accurate?
Thermo Neslab Chiller[1]
Accurate?
OptiTemp OTI-5WL-P3-216 Chiller[1]
Accurate?
LCD Monitor[1]
Accurate?
Manufacturer
Oxford Instruments[1]
Accurate?
Model
Plasmalab 100 ICP 180[1]
Accurate?
Tool type
Reactive Ion Etcher[1]
Accurate?
Category
Etch[2]
Accurate?
Monitor
LCD Monitor[1]
Accurate?
Chiller
Thermo Neslab Chiller[1]
Accurate?
Chiller
OptiTemp OTI-5WL-P3-216 Chiller[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Voltage208V, 50/60Hz[1]
  • ConfigurationWith VAT PM-5 Adaptive Pressure Controller[1]
  • ConfigurationAdixen ACT 1300M Turbopump Controller[1]
  • ConfigurationLeybold D65BCS Vacuum Pump with Oil Filter & Exhaust Filter[1]
  • ConfigurationGas Box[1]
  • Power208V, 50/60Hz[1]
  • Adaptive pressure controllerVAT PM-5[1]
  • Turbopump controllerAdixen ACT 1300M[1]
  • Vacuum pumpLeybold D65BCS with oil filter and exhaust filter[1]
  • Gas deliveryGas Box[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What electrical supply is required?

The tool operates on 208V, 50/60Hz.[1][2]

Does the system include a chiller?

Yes, it includes a Thermo Neslab chiller and an OptiTemp OTI-5WL-P3-216 chiller.[1][2]

What vacuum components are included?

The system includes an Adixen ACT 1300M turbopump controller and a Leybold D65BCS vacuum pump with oil filter and exhaust filter.[1][2]

Is a pressure controller provided?

Yes, the tool comes with a VAT PM-5 adaptive pressure controller.[1][2]

What gas delivery components are included?

The system includes a gas box.[1][2]

Not publicly documented

The following facts about the Plasmalab 100 ICP 180 RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmalab 100 ICP 180 RIE are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Plasmalab 100 ICP 180 RIE are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Plasmalab 100 ICP 180 RIE are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Plasmalab 100 ICP 180 RIE are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Plasmalab 100 ICP 180 RIE is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
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Last updated Oct 10, 2026.

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