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Comparison ledger

0010-16392 ESC AssemblyversusPlasmalab 100 ICP 180 RIE

Applied Materials 0010-16392 ESC Assembly, Oxford Instruments Plasmalab 100 ICP 180 RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
Plasmalab 100 ICP 180 RIEOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyOxford Instruments Plasmalab 100
Specifications
OEMApplied Materials[1]—
Model0010-16392[1]Plasmalab 100 ICP 180[3]
TypeESC Assembly[1]—
Wafer Size300 mm[2]—
Electrode ConfigurationDual[2]—
Voltage—208V, 50/60Hz[3]
Configuration—With VAT PM-5 Adaptive Pressure Controller[3]
Manufacturer—Oxford Instruments[3]
Tool type—Reactive Ion Etcher[3]
Category—Etch[4]
Wafer size—6 inch[3]
Power—208V, 50/60Hz[3]
Adaptive pressure controller—VAT PM-5[3]
Turbopump controller—Adixen ACT 1300M[3]
Vacuum pump—Leybold D65BCS with oil filter and exhaust filter[3]
Gas delivery—Gas Box[3]
Control computer—Control Computer (no HDD)[3]
Monitor—LCD Monitor[3]
Chiller—Thermo Neslab Chiller[3]
Computer cart—Computer Cart[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com