Oxford Instruments Plasmalab 100

Models in this family

1. 

   Plasmalab 100

   The Oxford Instruments Plasmalab 100 is a plasma-enhanced chemical vapor deposition (PECVD) system that handles wafers from 2 to 8 inches and is used for depositing silicon dioxide, silicon nitride, and other dielectric films.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   System 100 PECVD / FlexAL ALD (thermal/plasma) cluster system	—	—	Described as a cluster comprised of a FlexAL ALD system and a PlasmaLab 100 PECVD system sharing a common loadlock.	uwaterloo.ca[1]
   Plasmalab 100 PECVD	—	—	Configured for plasma-enhanced chemical vapor deposition	Equipment inventory listing[2]
   Plasmalab 100 ICP Dielectric Etcher	—	—	Configured for fluorine-based dielectric etching with ICP	cnfusers.cornell.edu[3]
   Plasmalab 100 ICP (Compound III-V)	—	—	Configured for compound III-V material etching	nanolab.berkeley.edu[4]

2. 

   Plasmalab 100 ICP 180
3. 

   Plasmalab 100 ICP 180 RIE

   The Oxford Instruments Plasmalab 100 ICP 180 RIE is an etch tool with a 6-inch wafer size and a 208V, 50/60Hz power spec.

4. 

   Plasmalab 100 ICP 380

   The Oxford Plasmalab 100 ICP 380 is an etcher, as stated in the product listing.

5. 

   Plasmalab 100 ICP-RIE

   The Oxford Plasmalab 100 ICP-RIE is an inductively coupled plasma reactive ion etch system.

6. 

   Plasmalab 100 Plus RIE

   Oxford Instruments Plasmalab 100 Plus RIE is a reactive ion etcher with a load-locked system and a gas module set up for Ar, O2, Cl2, and SiCl4.

7. 

   Plasmalab 100 RIE

   The Oxford Plasmalab 100 RIE is a reactive ion etching platform for dielectric etching, MEMS, and R&D applications.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Plasmalab 100 Plus	—	—	Allows small batch processing for R&D and Pilot Production; supports up to 8''/200 mm wafers; load-locked system	classoneequipment.com[5]
   Plasmalab 100 RIE (FL)	—	—	Configured for SiO2 plasma etching; supports wafer sizes up to 300 mm; 330 mm platen; water-cooled electrode; Advanced Energy RFX 600A RF generator; Alcatel turbo pump; blue PLC control	semistarcorp.com[6]

Sources