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Ulvac

Phi Adept 1010 Automated Depth Profiling

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Phi Adept 1010 Automated Depth Profiling — Inventory photo
Fig. 01Phi Adept 1010 Automated Depth ProfilingInventory photo[1]

What it is

The Ulvac Phi Adept 1010 Automated Depth Profiling Tool is a ULVAC-PHI quadrupole dynamic secondary ion mass spectrometer used for automated depth profiling.[1][2][3]

The Adept 1010 is a semiconductor analytical instrument associated with quantitative depth profiling of solid materials.[3][2]

How it works

A quadrupole analyzer separates the secondary ions by mass-to-charge ratio during continuous sputtering in dynamic mode.[3][2]

The Adept 1010 uses a primary ion beam and secondary ion extraction optics for depth profiling and surface characterization.[3][2]

Applications

The Adept 1010 is used for quantitative dopant depth profiling in semiconductor structures.[3][2]

The Adept 1010 is used for thin-film interface analysis and trace-contaminant measurement.[3][2]

What do the numbers mean?

Power & electrical1

Power supply
200–230 V AC, 50/60 Hz, 50 A (single-phase)[2]
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Dimensions & facilities2

Net weight
1,350 kg[2]
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Shipping weight
~2,400 kg[2]
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Configuration & options7

Manufacturer
Ulvac[1]
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Model
Phi Adept 1010[1]
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Instrument type
Quadrupole dynamic secondary ion mass spectrometer (SIMS)[2]
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Primary beam energy range
0.25–11 keV[3]
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Mass range
1–340 amu[3]
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Operating temperature
20°C ± 3°C[2]
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Relative humidity
<50%[2]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Power supply200–230 V AC, 50/60 Hz, 50 A (single-phase)[2]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What type of instrument is the Adept 1010?

The Adept 1010 is a quadrupole dynamic secondary ion mass spectrometer.[3][2]

What is the main use of the Adept 1010?

The Adept 1010 is used for quantitative depth profiling of semiconductor structures, thin-film interfaces, and trace-contaminant layers.[3][2]

Does the Adept 1010 operate in dynamic SIMS mode?

The Adept 1010 operates in dynamic mode.[3][2]

What analytical principle does the Adept 1010 use?

The Adept 1010 uses sputter-initiated secondary ion emission followed by quadrupole mass analysis.[3][2]

Not publicly documented

The following facts about the Phi Adept 1010 Automated Depth Profiling are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Phi Adept 1010 Automated Depth Profiling are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Phi Adept 1010 Automated Depth Profiling are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Phi Adept 1010 Automated Depth Profiling are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Phi Adept 1010 Automated Depth Profiling are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Phi Adept 1010 Automated Depth Profiling is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]instrumenthive.com — instrumenthive.cominstrumenthive.com
  3. [3]instrumenthive.com — instrumenthive.cominstrumenthive.com
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Last updated Oct 4, 2026.

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