Tokyo Electron

Expedius Plus

Wet Processing / Clean Tokyo Electron Expedius family

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The Expedius Plus is a wet bench. The Expedius Plus is used for pre-diffusion clean applications. The Expedius Plus listing includes SPM, QDR (hot), APM, POU, HPM, and dryer sections.^[1]^[2]

Expedius Plus — Inventory photo — Fig. 01Expedius PlusInventory photo^[1]

Power

950 kHz, 2400W (600*4)^[1]

Gas delivery

auto concentration feedback^[1]

What it is

The Expedius Plus is configured as a multi-bath wet bench with separate chemical and rinse modules and a dryer.^[1]^[2]

How it works

General reference — not yet source-verified

A wet processing bench uses successive chemical baths, rinse steps, and drying to remove contaminants and prepare wafers for later process steps.

Where it fits in the process flow

The Expedius Plus is used for pre-diffusion clean processing.^[1]^[2]

Why won't it start?

Documented failure modes, common issues, and field considerations.

IPA Detect Sensor damage
SPM Bath damage

What do the numbers mean?

Power & electrical5

Megasonic: 950 kHz, 2400W (600*4)^[1]
Bath-2: QDR (hot); operating DIW rinse (75°C, 40 – 80 L/min); bath material: PTFE; megasonic: 950 kHz, 2400W (600*4)^[1]
Bath-3: APM; operating 35 - 85°C; NH4OH/H2O2/DIW (1:1:15); 15 L/min; circulation; chemical spiking: auto concentration feedback; bath material: PTFE; megasonic: 950 kHz, 2400W (600*4)^[1]
Bath-4: POU; operating 70°C; NH4OH/H2O2 DIW shower (hot / cold); bath material: PTFE; megasonic: 950 kHz, 2400W (600*4)^[1]
Bath-6: QDR (hot); operating DIW rinse (75°C, 40 – 80 L/min); bath material: PTFE; megasonic: 950 kHz, 2400W (600*4)^[1]

Gas & chemistry2

Chemical spiking: auto concentration feedback^[1]
Bath-1: SPM; operating 110 - 150°C; H2SO4/H2O2 (3:1); circulation; chemical spiking: auto concentration feedback; bath material: quartz^[1]

Configuration & options27

Application: Pre-Diffusion Clean^[1]
Bath-1: SPM^[1]
Operating: 110 - 150°C, H2SO4/H2O2 (3:1), circulation^[1]
Bath Material: Quartz^[1]
Bath-2: QDR (hot)^[1]
Operating: DIW rinse (75°C, 40 – 80 L/min)^[1]
Bath Material: PTFE^[1]
Bath-3: APM^[1]
Operating: 35 - 85°C, NH4OH/H2O2/DIW (1:1:15), 15 L/min, circulation^[1]
Bath-4: POU^[1]
Operating: 70°C, NH4OH/H2O2 DIW Shower (hot / cold)^[1]
Bath-5: HPM^[1]
Operating: 35 - 80°C, HCL/H2O2/DIW (1:1:5)^[1]
Bath-6: QDR (hot)^[1]
Operating: DIW rinse (75°C, 40 – 80 L/min) - Bath Material: PTFE^[1]
Dryer: SD2^[1]
Operating: 49% DHF (1:200), IPA/N2 200°C, 100 L/min^[1]; Resistivity monitoring (Horiba)^[1]
Operating: DIW rinse (75°C, 40 – 80 L/min) Injection: H2O2/NH4OH^[2]
Dryer: SD2*2^[2]; No HDD^[2]
OEM: Tokyo Electron^[1]
Model: Expedius Plus^[1]
Equipment type: Wet Bench^[1]
Bath-5: HPM; operating 35 - 80°C; HCL/H2O2/DIW (1:1:5); bath material: quartz^[1]
Dryer: SD2; operating 49% DHF (1:200), IPA/N2 200°C, 100 L/min; resistivity monitoring (Horiba); bath material: PTFE^[1]
Vintage: 2007^[1]

Vintage & configurations

2007Vintage^[1]
Source states 2007 Vintage.

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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

Veeco Waferstorm M 3305 Lift Off— Same function class: Wet Processing / Clean, UnknownCompare in depthsource^[3]
Lam Research SEZ SP 304— Same function class: Wet Processing / Clean, UnknownCompare in depthsource^[4]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Chemical spikingauto concentration feedback^[1]
Megasonic950 kHz, 2400W (600*4)^[1]
Bath-1SPM; operating 110 - 150°C; H2SO4/H2O2 (3:1); circulation; chemical spiking: auto concentration feedback; bath material: quartz^[1]
Bath-2QDR (hot); operating DIW rinse (75°C, 40 – 80 L/min); bath material: PTFE; megasonic: 950 kHz, 2400W (600*4)^[1]
Bath-3APM; operating 35 - 85°C; NH4OH/H2O2/DIW (1:1:15); 15 L/min; circulation; chemical spiking: auto concentration feedback; bath material: PTFE; megasonic: 950 kHz, 2400W (600*4)^[1]
Bath-4POU; operating 70°C; NH4OH/H2O2 DIW shower (hot / cold); bath material: PTFE; megasonic: 950 kHz, 2400W (600*4)^[1]
Bath-6QDR (hot); operating DIW rinse (75°C, 40 – 80 L/min); bath material: PTFE; megasonic: 950 kHz, 2400W (600*4)^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What process is the Expedius Plus used for?

The Expedius Plus is used for pre-diffusion clean processing.^[1]^[2]

Not publicly documented

The following facts about the Expedius Plus are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented variants, configuration options, or revision breakpoints of the Expedius Plus are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Expedius Plus are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Expedius Plus is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Expedius Plus are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Expedius Plus are on record.
Answerable by: university cleanroom staff or an OEM application specialist