Perkin Elmer
PE 4400
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Perkin Elmer PE 4400 is a sputtering system. The Perkin Elmer PE 4400 is a deposition tool. The Perkin Elmer PE 4400 supports substrate size from small to 6 inch.[1][2][3]
What it is
The Perkin Elmer PE 4400 is a sputtering system used for deposition in semiconductor and related thin-film work.[1][2][4]
The PE 4400 belongs to the Perkin-Elmer sputtering deposition family and is part of a legacy tool line used in production and research and development.[4]
How it works
The PE 4400 family is configured with a circular cathode, a cathode port arrangement, and a vacuum process chamber with load lock hardware.[3]
The PE 4400 family uses sputter deposition modes that include RF magnetron operation, with other cathode and power arrangements noted as options in some configurations.[3]
Applications
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Not operational
What do the numbers mean?
Power & electrical4
- Sputter rate
- 20 to 500 Angstroms/kw-min depending on model, cathode, process, sputter material, etc.[3]
Wafer handling3
- Throughput per batch
- 3 inch wafer, 30 pieces; 4 inch wafer, 13 pieces; 5 inch wafer, 9 pieces; 6 inch wafer, 7 pieces[3]
Gas & chemistry2
Performance1
Configuration & options8
- Not operational[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Denton Vacuum Discovery Cathode— Same function class: Deposition, nullCompare in depthsource[3]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the PE 4400 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PE 4400 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the PE 4400 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PE 4400 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the PE 4400 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the PE 4400 are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]allwin21.com — allwin21.comallwin21.com
- [4]Perkin-Elmer Sputtering Despostion Systems- PE 4400 — perkin-elmer-sputter.comperkin-elmer-sputter.com
Last updated Oct 6, 2026.
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