Lapmaster
The Lapmaster 96 Continuous Polisher is a continuous polishing machine. The Lapmaster 96 Continuous Polisher requires a 3-phase electrical supply at 60 Hz, 460 V, and 80 A.[1]

A continuous CMP polisher typically consists of a rotating platen covered with a polishing pad. Wafers are held in a carrier that presses them against the pad with controlled downforce. Slurry containing abrasive particles and reactive chemicals is dispensed onto the pad. The combined mechanical abrasion and chemical etching remove material from the wafer surface.
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The following facts about the 96 Continuous are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 96 Continuous are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 96 Continuous are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 96 Continuous are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 96 Continuous are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 96 Continuous is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 26, 2026.
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