Lam Research
The Lam 2300 V 2 Kiyo 45 is a semiconductor etcher from Lam Research. The Lam 2300 V 2 Kiyo 45 is configured for polysilicon etching with a 4ch (four-channel) setup. The Lam 2300 V 2 Kiyo 45 supports process gases including SiCl4, BCl3, HBr, CH4, CHF3, Cl2, CH2F2, CH3F, NF3, O2, CF4, He, Ar, and N2.[1]

Plasma etching reactors generate a plasma from process gases using radio-frequency power. The ionized species chemically react with exposed wafer materials while ions provide directional bombardment, enabling anisotropic etching.
The Kiyo family of etchers typically employ inductively coupled plasma (ICP) sources to achieve high plasma density at low pressures. Process chambers are clustered around a central wafer-handling robot.
In a semiconductor fab, plasma etching is used after photolithography to transfer the pattern into the underlying layer. The etched wafer then proceeds to resist stripping and subsequent processing steps.
Plasma etching is applied to a variety of materials including polysilicon, silicon dioxide, and silicon nitride during the fabrication of transistors and interconnect structures.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Lam 2300 V 2 Kiyo 45 Etcher - Polysilicon - 4ch - SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2 - Edwards STP XA2703CV 2008 Vintage | — | 2008 | Listed with polysilicon, 4ch, the gas set, Edwards STP XA2703CV, and 2008 vintage. | Equipment inventory listing[1] |
| Lam 2300 V 2 Kiyo 45 Etcher - Polysilicon - 4ch - SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2 - Edwards STP XA2703CV 2007 Vintage | — | 2007 | Listed with polysilicon, 4ch, the gas set, Edwards STP XA2703CV, and 2007 vintage. | Equipment inventory listing[4] |
| Lam 2300 V 2 Kiyo 45 Etcher - Polysilicon - 4ch - SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2 - Edwards STP XA2703CV 2009 Vintage | — | 2009 | Listed with polysilicon, 4ch, the gas set, Edwards STP XA2703CV, and 2009 vintage. | Equipment inventory listing[5] |
| Lam 2300 V 2 Kiyo 45 Etcher | — | 2007–2007 | Listed with an Edwards STP XA2703CV pump and described as 2007 vintage. | Equipment inventory listing[4] |
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The following facts about the 2300 V 2 Kiyo 45 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 2300 V 2 Kiyo 45 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 2300 V 2 Kiyo 45 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 2300 V 2 Kiyo 45 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 2300 V 2 Kiyo 45 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 2300 V 2 Kiyo 45 are on record.
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Last updated Oct 11, 2026.
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