Comparison ledger
Applied Materials 0010-16392 ESC Assembly, Lam Research 2300 V 2 Kiyo 45, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-16392 ESC AssemblyApplied Materials | 2300 V 2 Kiyo 45Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-16392 ESC Assembly | Lam Research 2300 |
| Cited variants | — |
|
| Specifications | ||
| OEM | Applied Materials[4] | — |
| Model | 0010-16392[4] | 2300 V 2 Kiyo 45[6] |
| Type | ESC Assembly[4] | — |
| Wafer Size | 300 mm[5] | — |
| Electrode Configuration | Dual[5] | — |
| Configuration | — | Polysilicon[1] |
| Process capability | — | Polysilicon[1] |
| Chamber configuration | — | 4ch (4-channel)[1] |
| Process gases | — | SiCl4, BCl3, HBr, CH4, CHF3, Cl2, CH2F2, CH3F, NF3, O2, CF4, He, Ar, N2[1] |
| Vacuum pump | — | Edwards STP XA2703CV[1] |
| Make | — | Lam[6] |
| Category | — | Etcher[6] |
| Process | — | Polysilicon etching[1] |
| Number of Chambers | — | 4ch[1] |
| Gas Chemistry | — | SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1] |
| Pump | — | Edwards STP XA2703CV[1] |
| Number of chambers | — | 4[1] |
| Process chambers | — | 4[1] |
| Process Type | — | Polysilicon[1] |
| Chamber Count | — | 4[1] |
| Supported Gases | — | SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1] |
| Vintage (some units) | — | 2007, 2008, 2009[2] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →