Canon
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The Canon FPA 3000 i 5 ++ is an i-line stepper designed for 8-inch wafers.[1]

In a semiconductor fabrication line, the stepper is used in the photolithography process step. Photoresist is first coated onto the wafer, then the stepper exposes the resist through the reticle. After exposure, the wafer moves to develop, etch, and other processing steps. The stepper is a critical tool for defining the smallest features on the wafer.
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
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The following facts about the FPA 3000 i 5 ++ i-Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FPA 3000 i 5 ++ i-Line are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the FPA 3000 i 5 ++ i-Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FPA 3000 i 5 ++ i-Line are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FPA 3000 i 5 ++ i-Line is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the FPA 3000 i 5 ++ i-Line are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 2, 2026.
The Nikon NSR SF 155 is an i-line stepper with a 12-inch wafer size.
The Nikon SF 130 is a lithography stepper with an i-line 365 nm exposure wavelength and support for 200 mm wafer exposure.