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ASML

5500 350 C

LithographyASML 5500 350 C family
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Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The ASML PAS 5500/350C is a DUV stepper used in photolithography. The PAS 5500/350C is typically configured as part of a lithography cluster with a TEL Clean Track ACT-8 coater/developer for processing 100 mm wafers. The PAS 5500/350C was manufactured in 1997 and includes a Cymer ELS 5600 excimer laser.[1][2]

5500 350 C — Inventory photo
Fig. 015500 350 CInventory photo[2]

What it is

The ASML 5500 350 C is a lithography stepper used for semiconductor pattern transfer.[2]

The ASML 5500 350 C is part of ASML's PAS 5500 family of projection lithography tools.[3]

How it works

The 5500 350 C is configured with a downstream wafer coat-and-develop track that supports the lithography cluster.[1]

Where it fits in the process flow

The ASML 5500 350 C operates with a coater and developer track in line with the stepper to form a lithography cluster for wafer processing.[1]

Applications

The ASML PAS 5500 family is used for integrated-circuit patterning in semiconductor manufacturing.[3]

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • Conversion to 150 mm (6") is possible, but it requires mechanical work on the track and extensive setup on the stepper.
  • Wafers going through the track must have a clean backside.
  • Small particles can hinder printing of small features and contaminate the wafer stage.
  • Wafer stage cleaning is described as delicate, complex, wearing, and time-consuming.
  • Users liable of wafer stage contamination may lose access to the machine.

What do the numbers mean?

Wafer handling2

Wafer size (configured)
100 mm (4 inch)[1]
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Configured wafer size
100 mm (4") wafers[1]
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Gas & chemistry1

Cluster configuration
In-line with TEL Clean Track ACT-8 coater/developer[1]
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Optics & imaging1

Laser source
Cymer ELS 5600 excimer laser[2]
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Configuration & options8

With:[2]
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Donaldson LithoGuard[2]
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Refurbished in 2015[2]
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Vintage year
1997[2]
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Model
5500 / 350 C[2]
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Equipment type
Stepper[2]
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Cluster pairing
In-line with the ASML PAS5500/350C stepper to form a DUV lithography cluster[1]
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Alternate designation
ASML PAS 5500/350C[1]
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Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
PAS 5500/350C———epfl.ch[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Cluster configurationIn-line with TEL Clean Track ACT-8 coater/developer[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What is the model designation?

The model designation is ASML 5500 / 350 C.[2]

Not publicly documented

The following facts about the 5500 350 C are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 5500 350 C are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the 5500 350 C are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the 5500 350 C is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 5500 350 C are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the 5500 350 C are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]epfl.ch — epfl.chepfl.ch
  2. [2]Inventory photo
  3. [3]ASML: Products - PAS 5500/1150C — asml.com (Jun 9, 2015)web.archive.org
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Last updated Oct 4, 2026.

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