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Applied Materials

Centura eMXP+

EtchApplied Materials Centura family
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The Applied Materials Centura eMXP+ is an etch tool for 8-inch wafers. The Centura eMXP+ is configured for oxide and a nitride spacer process. The Centura eMXP+ operates on 208 VAC at 50/60 Hz with a full load current of 240 A.[1][2]

Centura eMXP+ — Inventory photo
Fig. 01Centura eMXP+Inventory photo[1]

Power

208 VAC[1]

Vacuum

Dry Pump[1]

What it is

The Applied Materials Centura eMXP+ is an etch tool used in semiconductor manufacturing.[1][2]

How it works

General reference — not yet source-verified

An etch tool removes selected material from a wafer by exposing the surface to a controlled plasma or reactive process so patterned areas transfer into the film stack.

Where it fits in the process flow

General reference — not yet source-verified

An etch system sits after pattern definition steps and before later film removal or device completion steps in a fab flow.

What do the numbers mean?

Power & electrical2

Voltage
208 VAC[1]
Accurate?
Frequency
50/60 Hz[1]
Accurate?

Vacuum & pumping2

Dry Pump[1]
Accurate?
Excludes
LPT, Chiller, Dry Pump[1]
Accurate?

Wafer handling3

HP+ Robot[1]
Accurate?
Wafer size
8 inch[1]
Accurate?
Robot
HP+ Robot[1]
Accurate?

Control & software1

Software Version
E4.8_26[1]
Accurate?

Configuration & options6

Oxide[1]
Accurate?
Full load current
240A[1]
Accurate?
Process
Nitride Spacer[1]
Accurate?
Excludes:[1]
Accurate?
LPT[1]
Accurate?
Chiller[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Voltage208 VAC[1]
  • Frequency50/60 Hz[1]
  • ConfigurationDry Pump[1]
  • ExcludesLPT, Chiller, Dry Pump[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the Centura eMXP+ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura eMXP+ are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Centura eMXP+ are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Centura eMXP+ are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Centura eMXP+ are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Centura eMXP+ is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Centura eMXP+ — Applied Materials | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
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Last updated Oct 10, 2026.

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