Manufacturer
Mattson
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23 entries
- Aspen II RTAMattson
The Mattson Aspen II RTA is an etch tool that processes 8-inch wafers.
CategoryEtch - Aspen II ICP LEMattson
The Mattson Aspen II ICP LE is an etcher for 8-inch wafers, introduced in 1997.
CategoryEtch - AST 280 RTPMattson
The Mattson AST 280 RTP is a rapid thermal processing (RTP) system for semiconductor thermal/diffusion applications.
CategoryThermal / Diffusion - AspenMattson
The Mattson Aspen is a family of plasma processing systems for strip, etch, and deposition, including the Aspen II and Aspen III platforms.
CategoryDeposition - Aspen IIMattson
The Mattson Aspen II Asher is a semiconductor ashing tool offered by Mattson, with configurations supporting 6-inch and 8-inch wafer sizes.
- AST 2800 RTPMattsonCategoryThermal / Diffusion
- Steag / AST 2900 RTPMattson
The Mattson / Steag / AST 2900 RTP is a rapid thermal processor used in semiconductor manufacturing.
CategoryThermal / Diffusion - AST 2000Mattson
- Millios RTPMattsonCategoryThermal / Diffusion
- RFS 3019Mattson
- Aspen IIIMattson
The Mattson Aspen III is a plasma processing platform offered in asher and plasma-enhanced chemical vapor deposition configurations, with variants supporting 200mm and 300mm wafers.
- AST 2800 SMIF RTPMattsonCategoryThermal / Diffusion
- Paradigme XP LightMattson
The Mattson Paradigme XP Light is an etcher used in semiconductor manufacturing.
CategoryEtch - ParadigmeMattson
The Mattson Paradigme (also styled as paradigmE) is a dry etch system used for advanced pattern multiplying etches at the 20 nm technology node and below.
CategoryEtch - AST 2800Mattson
The Mattson AST 2800 is a thermal processing tool in the AST 2800 family.
- Steag / AST Heatpulse 610 RTPMattson
The Mattson Steag / AST Heatpulse 610 RTP is a rapid thermal process (RTP) system for 6-inch wafers with a temperature range of 400-1250 °C.
CategoryThermal / Diffusion - Helios RTPMattson
General referenceThe Mattson Helios RTP is a rapid thermal processing (RTP) system used for single-wafer thermal treatments in semiconductor manufacturing.
CategoryThermal / Diffusion - 2800 RTPMattsonCategoryThermal / Diffusion
- AST 3000 RTPMattsonCategoryThermal / Diffusion
- AST 2900 RTPMattsonCategoryThermal / Diffusion
- 8800Mattson
Mattson 8800 is a third-generation RTP tool developed for 0.25-micron process requirements and described as a 200 mm single-wafer RTP tool.
CategoryThermal / DiffusionWafer200mmNode0.25-micron - SHS 2800 RTAMattson
The Mattson SHS 2800 RTA is a rapid thermal anneal system described with front-end or tool-controller configurations, a ripple pyrometer for temperature measurement, and a jet venturi cooling system.
CategoryThermal / Diffusion - Steag / AST 2800 RTPMattson
The Mattson / Steag / AST 2800 RTP System is a Rapid Thermal Process system.
CategoryThermal / Diffusion
