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Comparison ledger

0020 17485 PartversusMVD300

Applied Materials 0020 17485 Part, SPTS MVD300, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
MVD300SPTS
OEMApplied MaterialsSPTS
CategoryDepositionDeposition
Wafer size—200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartSPTS MVD300
Cited variants—
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[2]—
System type—Molecular Vapor Deposition (MVD) system[1]
Configured models—MVD300 / MVD300E[1]
Target manufacturing use—High volume manufacturing applications[1]
Processing mode—Batch processing[1]
Wafer handling—200mm wafers (Pod loader or EFEM available); 300mm wafers (EFEM enabled)[1]
Other substrate formats—Singulated die on tape frames; components on trays; custom substrate fixturing available[1]
Precursors—Up to 4 precursors[1]
Integrated functions—Integrated plasma surface treatment and chamber clean capability[1]
Automation—Automated process sequence routines[1]
Diagnostics—Extensive self-diagnostic and data logging capability[1]
Reliability—Exceptional reliability[1]
Process compatibility—MVD and ALD-capable[1]
Wafer size—200mm (Pod loader or EFEM) / 300mm (EFEM)[1]
Number of precursors—Up to 4[1]
Plasma treatment—Integrated plasma surface treatment and chamber clean capability[1]
Substrate types—Wafers, singulated die on tape frames, components on trays, custom fixturing[1]
ALD capability—MVD and ALD-capable[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing