Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, MKS 626D, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 626DMKS |
|---|---|---|
| OEM | Applied Materials | MKS |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | MKS 626D |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Pressure range (Full Scale) | — | 0.1 to 1000 Torr[3] |
| Accuracy | — | 0.25% to 0.50% of Reading[3] |
| Overpressure limit | — | 45 psia (310 kPa)[3] |
| Input voltage | — | ±15 VDC[3] |