Pfeiffer
ATH1603M alternatives
Comparable Deposition equipment documented in the Waferpedia catalog.
6 comparable tools
STS
310
100mm
Deposition
The STS 310 is a plasma-enhanced chemical-vapor-deposition (PECVD) system used for depositing silicon dioxide and silicon nitride films on 100-mm diameter wafers.
Pfeiffer
ACP040G
100mm
Deposition
Pfeiffer
ACP28G
100mm
Deposition
The Pfeiffer Adixen ACP28G is a compact dry rotary lobe vacuum pump designed for pumping traces of corrosive gas, featuring a frictionless multi-stage roots design and an integrated frequency converter.
Temescal
FC-2000
100mm
Deposition
The Temescal FC-2000 is a load-locked bell jar deposition system for small-scale production and R&D, with listed substrate fixtures for 2-inch, 3-inch, 100-mm, and 150-mm wafers.
Pfeiffer
HiPace300
100mm
Deposition
The Pfeiffer HiPace300 is a turbo pump used as the secondary pump in the loadlock of the Alliance-Concept EVA 451 thermal evaporator.
Applied Materials
0010-13622 RF Match for
Deposition
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
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