Comparison ledger
Nikon 1505 G 6 E, Quintel Q 4000 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | Q 4000 MaskQuintel |
|---|---|---|
| OEM | Nikon | Quintel |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | Quintel Q 4000 Mask |
| Specifications | ||
| Configuration | 5" reticle[1] | Quintel Power Supply 365-405nm source; bottom shelve right side.[4] |
| Resolution | 650 nm[2] | — |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | — |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| Equipment type | — | Mask aligner[4] |
| Power supply source | — | 365-405nm source[4] |
| Mask holder | — | Fixed[4] |
| Split field objectives | — | With zoom capabilities[4] |
| Head lift exposure source | — | With zoom objectives[4] |
| Illumination control panel and vacuum/separation pressure gauge | — | Left side[4] |
| Joy stick 1 | — | Mask viewing manipulator; left side[4] |
| Joy stick 2 | — | Substrate manipulator; right side[4] |
| Theta substrate adjustor | — | Left side[4] |
| Objective focus switch / coarse align / contact separation button | — | Right side[4] |
| Parameter control display panel | — | Right side[4] |
| Power on switch | — | Right side[4] |
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