Waferpedia

Comparison ledger

EDC-650-15BversusH6-15 B

Laurell EDC-650-15B, Laurell H6-15 B, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
H6-15 BLaurell
OEMLaurellLaurell
CategoryResist ProcessingResist Processing
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLaurell EDC-650-15BLaurell H6-15 B
Specifications
TypeEDC System[1]Spin Coater[3]
Series650 Series[1]—
Max substrate size300 mm (9" x 9")[1]—
Max RPM12,000 rpm[1]—
Mounting optionsTabletop, In-Deck, On-Deck[1]—
ModelEDC-650-15B[1]H6-15 B[3]
Maximum speed12,000 rpm[1]—
Recommended speed3,000 RPM[2]—
Recommended chuck typenon-vacuum chucks[2]—
Controller—650-series[3]
Max. Substrate Size—300mm (9" x 9")[3]
Max. RPM—12000 rpm[3]
Mounting Options—Tabletop, In-Deck, On-deck[3]

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]laurell.comlaurell.com
  2. [2]premier-sols.compremier-sols.com
  3. [3]images.laurell.comimages.laurell.com