Waferpedia

Comparison ledger

1 EC 101 R 485 Photoresist SpinnerversusAZ400K

Headway 1 EC 101 R 485 Photoresist Spinner, YES AZ400K, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMHeadwayYES
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHeadway 1 EC 101 R 485 Photoresist SpinnerYES AZ400K
Specifications
Vacuum requirement23" Hg[1]—
Electrical115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1]—
Machine type—auto developer[2]
Model—AZ400K[2]
Hotplate configuration—dual hotplate spin bowl[2]
Vacuum system—vacuum pump system[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]aggiefab.tamu.eduaggiefab.tamu.edu