Headway
1 EC 101 R 485 Photoresist Spinner
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Headway 1 EC 101 R 485 is a photoresist spinner used for resist processing. The Headway 1 EC 101 R 485 requires a vacuum supply of 23 inches of mercury. The Headway 1 EC 101 R 485 operates on 115 V, 3 A, 50/60 Hz, single-phase electrical power.[1][2]
What it is
General reference — not yet source-verifiedPhotoresist spinners are used to apply a uniform layer of photosensitive polymer onto a substrate. The substrate is held on a vacuum chuck and spun at high speed. Liquid resist dispensed onto the center spreads radially by centrifugal force. Spin speed and acceleration control the final thickness.
How it works
General reference — not yet source-verifiedA photoresist spinner operates by accelerating a substrate to a controlled rotational speed. A small volume of liquid photoresist is dispensed onto the center of the substrate while it is either stationary or spinning slowly. The spin speed is then ramped up to the desired process speed, causing the resist to spread evenly and thin to a uniform coating. The vacuum chuck holds the substrate in place through a vacuum applied through the chuck. After coating, the substrate is typically removed and subjected to a soft bake to evaporate solvents.
Where it fits in the process flow
General reference — not yet source-verifiedIn semiconductor manufacturing, photoresist spinners are part of the lithography sequence. A clean wafer is first primed, then coated with photoresist in the spinner. After coating, the wafer moves to a soft bake step and then to exposure. The spinner is typically a standalone benchtop or integrated track module.
What do the numbers mean?
Power & electrical2
Vacuum & pumping2
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the 1 EC 101 R 485 Photoresist Spinner are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 1 EC 101 R 485 Photoresist Spinner are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 1 EC 101 R 485 Photoresist Spinner are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 1 EC 101 R 485 Photoresist Spinner are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 1 EC 101 R 485 Photoresist Spinner are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 1 EC 101 R 485 Photoresist Spinner is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]1 EC 101 R 485 Photoresist Spinner — Headway | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
- [3]Headway 1 EC 101 R 485 Photoresist Spinner - Fab Spares LLC — fab-spares.comfab-spares.com
Last updated Oct 11, 2026.
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