Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, Tokyo Electron Act 12 DUV Photoresist Coater Developer Track, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Act 12 DUV Photoresist Coater Developer TrackTokyo Electron | |
|---|---|---|
| OEM | Headway | Tokyo Electron |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | The direction of wafer flow is right to left |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | Tokyo Electron Act 12 |
| Specifications | ||
| Vacuum requirement | 23" Hg[1] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Electrical power | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Wafer size | — | The direction of wafer flow is right to left[2] |
| Configuration | — | Type 4 Main controller[2] |
| OEM | — | Tokyo Electron[2] |
| Model | — | Act 12 DUV Photoresist Coater / Developer Track[2] |
| Category | — | Resist Processing[2] |
| Wafer flow direction | — | right to left[2] |
| Main controller | — | Type 4[2] |
| Load ports | — | 4 FOUP load ports for 12 inch wafers[2] |
| COT units | — | 2[2] |
| BARC units | — | 2[2] |
| DEV units | — | 4[2] |
| WEE unit | — | 1[2] |
| ADH units | — | 2[2] |
| Closed loop T&H system | — | Included[2] |
| IFB | — | for wafer transport system NIKON NSR-S204B[2] |
| Vintage | — | 2009[2] |
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