Comparison ledger
Brooks 017-0024-01 Prealigner, Nikon NSR S 307 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 017-0024-01 PrealignerBrooks | NSR S 307 ENikon |
|---|---|---|
| OEM | Brooks | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | Wafer X-Axis is out of order |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brooks 017-0024-01 Prealigner | Nikon NSR |
| Specifications | ||
| Wafer | — | 300 mm[1] |
| Exposure Light Source | — | ArF excimer laser[1] |
| Wavelength | — | 193[1] |
| Resolution | — | 80 nm[2] |
| Alignment Accuracy | — | 12 nm[1] |
| Exposure Field | — | 26 x 33 mm[1] |
| Reduction Ratio | — | 1:4[1] |
| Wafer size | — | Wafer X-Axis is out of order[1] |
| Configuration | — | Hard Disk, 300mm[3] |
| Light Source | — | ArF excimer laser[1] |
| Lens NA | — | 0.85[2] |
| Lens Data | — | Cymer XLA 140[3] |
| Wafer Size Support | — | 200 mm / 300 mm[2] |
| Throughput (300 mm) | — | > 112 WPH[2] |
| Throughput (200 mm) | — | > 160 WPH[2] |
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