Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, KLA 4PP-TypeH, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 4PP-TypeHKLA |
|---|---|---|
| OEM | Applied Materials | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | KLA 4PP-TypeH |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Product type | — | Four-point probe (4PP)[3] |
| Probe spacing | — | 0.6mm[4] |
| Tip radius | — | 200um[4] |
| Force | — | 100gm[4] |
| Load | — | 100gm[5] |
| Material | — | 230-0920[5] |
| Intended use | — | Implant/high impedance surface measurement[5] |
| Compatible systems | — | Filmetrics R50 / R54 4PP measurement systems[5] |
| Manufacturer | — | Filmetrics[4] |