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0010-13622 RF Match forversus3290

Applied Materials 0010-13622 RF Match for, Novellus 3290, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
3290Novellus
OEMApplied MaterialsNovellus
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forNovellus 3290
Cited variants—
  • Novellus / Varian 3290 STQ[1]
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[2]ECS 3000 or MST 3000[3]
Model0010-13622[2]—
Product TypeRF Match for PVD (Physical Vapor Deposition)[2]—
FeatureHigh Efficiency HE RF Match-Bias[2]—
Process type—PVD sputter physical vapor deposition[3]
Wafer size—6 inch[3]
Configuration options—ECS 3000 or MST 3000[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com