Varian
E 500 EHPI Ion Implant
What is it?
What do the numbers mean?
Power & electrical1
Vacuum & pumping6
Wafer handling3
Gas & chemistry1
- Gas Box:[1]
Control & software4
Configuration & options22
- CE Mark[1]
- IHC Arc PS[1]
- IHC Filament PS[1]
- IHC Bias PS[1]
- Extraction PS[1]
- Source Magnet Polarity Switch[1]
- String #1 SDS[1]
- String #2 SDS[1]
- String #3 SDS[1]
- String #4 HP[1]
- Beamline:[1]
- Two Step Reducer[1]
- Gauss Meter[1]
- Terminal Pneumatics[1]
Vintage & configurations
- 2000Vintage[1]
2000 vintage
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Axcelis GSD 200 E 2 High Current— Same function class: Ion Implantation, nullCompare in depthsource[2]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What computer and software run the control system?
The control system uses a Windows 7 computer with software version V15.10.12.[1]
Does the system include a chuck for wafer handling?
Yes, the end station includes an electrostatic chuck (ESC) system.[1]
What controls are provided for beam scanning and wafer movement?
The system includes a scanning faraday controller and a rotating platen servo controller, along with platen tilt and uniformity controllers.[1]
Not publicly documented
The following facts about the E 500 EHPI Ion Implant are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the E 500 EHPI Ion Implant are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the E 500 EHPI Ion Implant are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the E 500 EHPI Ion Implant are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the E 500 EHPI Ion Implant is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the E 500 EHPI Ion Implant are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]Equipment inventory listing
Last updated Sep 23, 2026.
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The Axcelis GSD 200 E 2 is a high current implanter with source-stated wafer sizes of 6 inch and 8 inch.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
