SUSS MicroTec
MJB 3 Mask
The SUSS MJB 3 Mask Aligner is a mask alignment system for 3-inch wafers. The SUSS MJB 3 uses a 350W Hg lamp and UV400 near UV optics to achieve 0.6 µm resolution. The SUSS MJB 3 includes a splitfield microscope with Leica objectives.[1]
What it is
Where it fits in the process flow
General reference — not yet source-verifiedMask alignment and exposure occur in the lithography stage of semiconductor processing, after a substrate has been prepared for pattern transfer.
A mask aligner supports the patterning step that follows coating and alignment and precedes development and later fabrication steps.
Applications
General reference — not yet source-verifiedA mask aligner is used for pattern transfer in photolithographic fabrication of microstructures on light-sensitive substrates.
What do the numbers mean?
Vacuum & pumping2
- 3" vacuum chuck[1]
Wafer handling1
Optics & imaging7
Configuration & options4
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- Photo-03 - SOP - MJB-3 Mask Aligner.pdfSOPumd.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of microscope is used on the MJB 3?
A splitfield microscope with Leica objectives of 3.5x, 10x, and 20x magnification.[1]
What light source does the MJB 3 use?
A 350-watt lamphouse with an Ushio USH-350DS mercury lamp.[1]
What is the wavelength range of the UV optics on the MJB 3?
350 to 450 nanometers (UV400 near UV optics).[1]
Not publicly documented
The following facts about the MJB 3 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MJB 3 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MJB 3 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MJB 3 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MJB 3 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MJB 3 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (9)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]Equipment inventory listing
- [6]Equipment inventory listing
- [7]Equipment inventory listing
- [8]PHOTO-03: MJB-3 Mask aligner- right of spin station #1 | Equipment | Maryland NanoCenter FabLab — nanocenter.umd.edunanocenter.umd.edu
- [9]Mask Aligner | Shared Materials Instrumentation Facility — smif.pratt.duke.edusmif.pratt.duke.edu
Last updated Oct 8, 2026.
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