SUSS MicroTec
MA 4 Mask
Provisional entry — research in progress
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The SUSS MA 4 Mask is a mask aligner manufactured by SUSS MicroTec. The SUSS MA 4 Mask is used in lithography processes.[1][2]
What it is
The SUSS MicroTec MA 4 is a mask aligner used in photolithography.[1][2]
How it works
General reference — not yet source-verifiedMask aligners position a substrate and a photomask in close proximity or contact and then expose the photoresist through the mask using ultraviolet light.
The alignment system allows the operator to align the mask to previous patterns on the substrate before exposure.
Where it fits in the process flow
General reference — not yet source-verifiedMask aligners are typically used in the photolithography step of a semiconductor fabrication process, after the substrate has been coated with photoresist and before the development step.
Upstream processes include wafer cleaning and photoresist spin-coating; downstream processes include resist development, etching, or ion implantation.
Applications
General reference — not yet source-verifiedMask aligners are widely used in research and development, small-volume production, and for substrates that are not compatible with stepper-based lithography.
Common application areas include MEMS, micro-optics, advanced packaging, and compound semiconductor devices.
What do the numbers mean?
No specifications recorded yet
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Where are the manuals?
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Not publicly documented
Field notes
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Not publicly documented
The following facts about the MA 4 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the MA 4 Mask are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 4 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 4 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 4 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 4 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]MA 4 Mask — SUSS MicroTec | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Sep 30, 2026.
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