SUSS MicroTec

Delta 12 AQ Spin

Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Gas delivery

AZ400K, AZ300MIF, CD26^[1]

Optics

125 mm x 125 mm, 150 mm x 150 mm^[1]

What it is

The SUSS MicroTec Delta 12 AQ is an automated photoresist developer station. The Delta 12 AQ supports cassette-to-cassette substrate operation. The process provides a dry in-dry out sequence. The station incorporates temperature controlled spray photoresist development.^[1]

How it works

The Delta 12 AQ uses temperature controlled spray development. Supported developer chemistries include AZ400K, AZ300MIF, and CD26.^[1]

Where it fits in the process flow

The Delta 12 AQ handles wafer diameters of 50 mm, 75 mm, 100 mm, 150 mm, and 200 mm. Maximum substrate thickness is 5 mm. Photomask sizes of 125 mm by 125 mm and 150 mm by 150 mm are supported.^[1]

Applications

Typical applications include photoresist development after optical exposure. The supported chemistries are used for common positive-tone resists.^[1]

What do the numbers mean?

Wafer handling4

Maximum wafer diameter: 200 mm^[1]
Maximum substrate thickness: 5 mm^[1]
Supported wafer diameters: 50 mm, 75 mm, 100 mm, 150 mm, 200 mm^[1]
Substrate handling: Cassette-to-cassette dry in-dry out^[1]

Gas & chemistry2

Supported developer chemistries: AZ400K, AZ300MIF, CD26^[1]
Developer temperature control: Precise control^[1]

Optics & imaging1

Supported photomask sizes: 125 mm x 125 mm, 150 mm x 150 mm^[1]

Control & software1

Operation type: Recipe controlled automated operation^[1]

Interested in this tool?

Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Supported developer chemistriesAZ400K, AZ300MIF, CD26^[1]
Developer temperature controlPrecise control^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What developer chemistries are supported?

AZ400K, AZ300MIF, and CD26 are supported.^[1]

What is the maximum substrate thickness?

Maximum substrate thickness is 5 mm.^[1]

Does the system support cassette-to-cassette operation?

Yes, the Delta 12 AQ provides cassette-to-cassette dry in-dry out processing.^[1]

Not publicly documented

The following facts about the Delta 12 AQ Spin are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Delta 12 AQ Spin are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Delta 12 AQ Spin are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Delta 12 AQ Spin are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Delta 12 AQ Spin are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Delta 12 AQ Spin is not on record.
Answerable by: an OEM datasheet or a fab qualification report