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Oxford Instruments

PlasmaPro 100 Cobra

Etch100mmOxford Instruments PlasmaPro 100 family
Research Quality: 60% complete
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Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Oxford Instruments PlasmaPro 100 Cobra is an inductively coupled plasma (ICP) etching tool. The PlasmaPro 100 Cobra primarily targets etching of metals (Al & Ti Alloys) with chlorine chemistry. The PlasmaPro 100 Cobra can also etch silicon and its insulators (SiO2, Si3N4 and SiC) with fluorine/carbonate chemistry and some polymers with oxygen chemistry.[1]

PlasmaPro 100 Cobra — Inventory photo
Fig. 01PlasmaPro 100 CobraInventory photo[2]

  • Plate 01PlasmaPro 100 Estrelas DRIE – Oxford Instruments Plasma Technology

    Oxford InstrumentsWatch on YouTube

Wafer size

100mm

Gas delivery

8 digital MFCs[1]

What it is

The Oxford Instruments PlasmaPro 100 Cobra is an inductively coupled plasma dry etcher used for semiconductor pattern transfer.[4][5][6]

What do the numbers mean?

Wafer handling7

Chuck type
Electrostatic clamping and biasing chuck[1]
Accurate?
Chuck temperature range
20°C to 60°C[1]
Accurate?
Processing diameter
Full wafer 100 mm[1]
Accurate?
Chuck
Electrostatic clamping and biasing chuck controlled in temperature[1]
Accurate?
Wafer size
100 mm (full wafer)[1]
Accurate?
Wafer size
Full wafer 100 mm[1]
Accurate?
Chuck
Electrostatic clamping and biasing chuck controlled in temperature from 20°C to 60°C[1]
Accurate?

Gas & chemistry6

Process gases
O2 (100sccm), O2 (10sccm), SF6, CF4, BCl3, Ar, Cl2, HBr[1]
Accurate?
Mass flow controllers
8 digital MFCs[1]
Accurate?
Supported gases
O2 (100 sccm), O2 (10 sccm), SF6, CF4, BCl3, Ar, Cl2, HBr[1]
Accurate?
Number of MFCs
8 digital Mass Flow Controllers[1]
Accurate?
Gases available
O2 (100sccm), O2 (10sccm), SF6, CF4, BCl3, Ar, Cl2, HBr[1]
Accurate?
Gases
O2 (100 sccm), O2 (10 sccm), SF6, CF4, BCl3, Ar, Cl2, HBr[1]
Accurate?

Optics & imaging3

End-point detection
Laser reflectometry/interferometry and Optical Emission Spectroscopy (OES)[1]
Accurate?
Endpoint detection
Laser reflectometry/interferometry and optical emission spectroscopy[1]
Accurate?
Endpoint detection
Laser reflectometry/interferometry and Optical Emission Spectroscopy (OES)[1]
Accurate?

Control & software1

With HDD and Software[2]
Accurate?

Configuration & options8

1x ICP Chamber with Cl2 and BCl3 Capability[2]
Accurate?
3x RIE Chambers[2]
Accurate?
Etch plasma type
Inductively Coupled Plasma (ICP)[1]
Accurate?
Type
Plasma etching tool[1]
Accurate?
Plasma type
High density plasma of ICP (Inductively Coupled Plasma) type[1]
Accurate?
Type
ICP (Inductively Coupled Plasma) etcher[1]
Accurate?
Etch materials
Al, Ti, TiN, Si, SiO2, Si3N4, polyimide, Al2O3[1]
Accurate?
Compatibility
Microelectronic compatible[1]
Accurate?
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Process gasesO2 (100sccm), O2 (10sccm), SF6, CF4, BCl3, Ar, Cl2, HBr[1]
  • Mass flow controllers8 digital MFCs[1]
  • Supported gasesO2 (100 sccm), O2 (10 sccm), SF6, CF4, BCl3, Ar, Cl2, HBr[1]
  • Number of MFCs8 digital Mass Flow Controllers[1]
  • Gases availableO2 (100sccm), O2 (10sccm), SF6, CF4, BCl3, Ar, Cl2, HBr[1]
  • GasesO2 (100 sccm), O2 (10 sccm), SF6, CF4, BCl3, Ar, Cl2, HBr[1]

Where are the manuals?

Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

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Frequently asked questions

What type of etcher is the PlasmaPro 100 Cobra?

It is an inductively coupled plasma reactive ion etcher.[6][5]

Not publicly documented

The following facts about the PlasmaPro 100 Cobra are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PlasmaPro 100 Cobra are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the PlasmaPro 100 Cobra are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the PlasmaPro 100 Cobra are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the PlasmaPro 100 Cobra are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the PlasmaPro 100 Cobra is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (9)Every fact above is drawn from these public sources
  1. [1]epfl.chepfl.ch
  2. [2]Inventory photo
  3. [3]cores.research.asu.educores.research.asu.edu
  4. [4]Etching ‒ Center of MicroNanoTechnology CMi ‐ EPFL — epfl.chepfl.ch
  5. [5]Oxford ICP Etcher (PlasmaPro 100 Cobra) - UCSB Nanofab Wiki — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  6. [6]ETCH-17: Oxford ICP Etcher - ALE | Equipment | Maryland NanoCenter FabLab — nanocenter.umd.edunanocenter.umd.edu
  7. [7]Equipment Capabilities - Electrical & Computer Engineering — ece.utoronto.caece.utoronto.ca
  8. [8]Tool Details - Harvard CNS — cns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
  9. [9]Utah-Nanofab-tool-list-July-2025-1 — nanofab.utah.edunanofab.utah.edu
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Last updated Oct 8, 2026.

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