Oxford Instruments
NGP 1000
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Oxford Instruments NGP 1000 is a plasma-enhanced chemical vapor deposition (PECVD) system. PECVD systems deposit thin films onto substrates through chemical reactions enhanced by a plasma. The machine is part of the Oxford Instruments PlasmaPro NGP 1000 family.[3][2][1]
The NGP 1000 is a single-wafer processing system configured with a load-locked chamber. The system is equipped with a 600 W 13.56 MHz HF RF generator for plasma generation.[1]
Where it fits in the process flow
General reference — not yet source-verifiedPECVD systems such as the NGP 1000 are positioned in the deposition segment of a semiconductor fab. The machine deposits dielectric and passivation films such as silicon nitride, silicon oxide, and silicon oxynitride. In a typical process flow, deposition follows cleaning and precedes lithography or etch steps, where the deposited film acts as an insulating layer, a hard mask, or a protective coating.
Applications
General reference — not yet source-verifiedThe NGP 1000 is used for depositing dielectric thin films in integrated circuit fabrication. Common applications include interlayer dielectrics, passivation layers, and diffusion barriers. The system is also employed for silicon nitride deposition, a material used in memory devices, logic devices, and MEMS.
What do the numbers mean?
Power & electrical1
Wafer handling4
- Load Locked Chamber[1]
Gas & chemistry2
Configuration & options2
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What deposition type is the Oxford Instruments NGP 1000?
The Oxford Instruments NGP 1000 is a plasma-enhanced chemical vapor deposition (PECVD) system.[3]
Not publicly documented
The following facts about the NGP 1000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NGP 1000 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NGP 1000 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NGP 1000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NGP 1000 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NGP 1000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
Last updated Oct 8, 2026.
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