Nikon

Wafer size
Wafer Equipment
Performance
Focus Calibration Repeatability:[1]
Optics
Within 100 nm ((3σ) )[1]
Steppers such as the i 12 D are used in the photolithography step of semiconductor manufacturing, where the circuit pattern is transferred from the reticle to the wafer.
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The following facts about the i 12 D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the i 12 D are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the i 12 D are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the i 12 D are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the i 12 D are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the i 12 D is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Sep 22, 2026.
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The SUSS MJB 3 350 W is a mask aligner for 3-inch wafers.
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