KLA
Quantox
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The KLA Quantox is a non-contact, corona-based silicon and oxide charge monitoring system. The Quantox system measures electrical characteristics such as charge composition, interface quality, dielectric thickness, and charge contamination of semiconductors and dielectric films.[1]
What it is
How it works
Where it fits in the process flow
Applications
What do the numbers mean?
Power & electrical1
Wafer handling1
Optics & imaging1
Performance1
Control & software3
- Measured parameters
- Charge composition, interface quality, dielectric thickness, charge contamination[1]
Configuration & options5
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Quantox XP | — | 2002 | Next-generation non-contact in-line electrical characterization system for 130 nm and below; uses ACTIV technology; accuracy within 0.10 Å; correlation >95% with device parameters. | kla.com[2] |
| Quantox 64000 | — | — | Monitoring model listed in Waferpedia. | waferpedia.com[3] |
| Quantox 64100 | — | — | Measurement model listed in Waferpedia. | waferpedia.com[3] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- CE complianceCompliant with EC Machinery, Low Voltage, and EMC directives[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of measurement system is the Quantox?
The Quantox is a non-contact, corona-based silicon and oxide charge monitoring system.[1][3]
What does the Quantox measure?
The Quantox measures charge composition, interface quality, dielectric thickness, and charge contamination of semiconductors and dielectric films.[1][3]
What process events can the Quantox help detect early?
The Quantox can support early detection of contamination and plasma damage events.[1]
Not publicly documented
The following facts about the Quantox are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Quantox are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Quantox are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Quantox are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Quantox is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Quantox are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]photonicmicrodevices.com — photonicmicrodevices.comphotonicmicrodevices.com
- [2]kla.com — kla.comkla.com
- [3]waferpedia.com — waferpedia.comwaferpedia.com
- [4]Equipment inventory listing
Last updated Sep 29, 2026.
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