KLA
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The KLA FX 200 is a thin film metrology tool used for film measurement, also referred to as the KLA Spectra FX200. The FX 200 handles 12-inch (300mm) wafers.[1]
Thin-film metrology tools such as the FX 200 are used for inline quality control after film deposition processes.[1]
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The equipment is the KLA FX 200, also referred to as the KLA-Tencor Spectra FX 200 or Spectra FX200.[2][1][4]
The FX 200 performs thin-film thickness measurement and is classified as a thin-film metrology tool.[1][4][3]
The FX 200 is used with 300 mm (12 inch) wafers.[1]
The FX 200 is used in metrology and incoming quality control (IQC) steps within the semiconductor manufacturing process.[1]
The following facts about the FX 200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FX 200 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the FX 200 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FX 200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FX 200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FX 200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 28, 2026.