J.A. Woollam
RC2
The Woollam RC2 is a spectroscopic ellipsometer for measuring thin film thickness and refractive indices. The Woollam RC2 accepts wafers up to 200 mm and uses a Xenon Arc lamp (75 W) with a wavelength range of 210 nm to 2500 nm.[1]
What it is
How it works
Spectroscopic ellipsometry uses polarized light after interaction with a surface to determine refractive indices and thicknesses of thin films. In this method, linearly polarized light is directed at a material at a certain angle of incidence, separated into parallel and perpendicular components, and the reflected light becomes elliptically polarized.[1]
The instrument estimates thickness from measurements of the ratio Rp/Rs, the reflection coefficients of the s- and p-components, with Ψ and Δ related to film thickness and refractive index. It does not directly measure refractive index or thickness; an algorithm is used to resolve those values from Ψ and Δ.[1]
The system includes a xenon arc lamp light source, a wavelength range from 210 nm to 2500 nm, an X-Y-Z motorized stage, motorized Z and autofocus, and an automatic tilt alignment routine.[1]
Where it fits in the process flow
Applications
The instrument is used for dielectric and semiconductor films such as silicon dioxide, silicon nitride, polysilicon, and amorphous silicon.[1]
It is also used for metallic films, with the note that the film generally needs to be very thin, and for organic layers such as carbon and photosensitive resists.[1]
- Dielectric films such as silicon dioxide, silicon nitride, polysilicon, and amorphous silicon
- Semiconductor films
- Metallic films
- Organic layers such as carbon and photosensitive resists
What do the numbers mean?
Wafer handling5
- Substrate size
- Up to 200 mm wafers; chips with a surface larger than the cross section of the incident beam[1]
- Substrate size
- Up to 200 mm wafers; chips with surface bigger than incident beam cross-section[1]
- Substrate size
- Up to 200 mm wafers, chips with surface larger than incident beam cross section[1]
- Substrate size
- Up to 200 mm wafers; chips with a measurement surface larger than the incident beam cross section[1]
Optics & imaging2
Performance4
Control & software1
Configuration & options11
- Measurement capability
- Measures thicknesses and refractive indices of thin films (transparent or not)[1]
- Measureable material classes
- Dielectric and semiconductor films (silicon dioxide, silicon nitride, polysilicon, amorphous silicon); metallic films; organic layers such as carbon and photosensitive resists[1]
- Measurement principle
- Measures the ratio of reflection coefficients Rp/Rs expressed as Ψ and Δ; refractive index (n) and thickness (t) are resolved by an algorithm from measured Ψ and Δ values[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What substrate sizes can the RC2 handle?
The RC2 accepts wafers up to 200 mm in diameter, as well as chips whose surface is larger than the incident beam cross‑section.[1]
What light source does the RC2 use?
The RC2 uses a 75 W Xenon arc lamp.[1]
What spot sizes can be achieved on the RC2?
Without focusing probes the beam diameter is 3 mm to 4 mm. With focusing probes the spot size is 120 micrometers.[1]
What types of films can the RC2 measure?
The RC2 can measure dielectric and semiconductor films (silicon dioxide, silicon nitride, polysilicon, amorphous silicon), metallic films (when very thin), and organic layers such as carbon and photosensitive resists.[1]
What are the key measurable parameters?
The RC2 determines thickness and refractive index of thin films.[1]
Not publicly documented
The following facts about the RC2 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the RC2 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the RC2 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the RC2 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the RC2 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the RC2 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]epfl.ch — epfl.chepfl.ch
- [2]alpha-se-ellipsometer-1 - J.A. Woollam — jawoollam.com (May 12, 2026)web.archive.org
Last updated Oct 8, 2026.
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