Hitachi
NB 5000 Dual Beam FIB-SEM
Plate 01Three-dimensional reconstructed image of rat cerebellar cortex acquired with HITACHI NB5000 FIB-SEM.
Hitachi High-Tech GlobalTVWatch on YouTube
What it is
The Hitachi NB 5000 Dual Beam FIB-SEM is a focused ion beam and scanning electron microscope system used in metrology and inspection.[1][2][3]
How it works
General reference — not yet source-verifiedA dual beam FIB-SEM combines a focused ion beam column with a scanning electron microscope column in one instrument.
The focused ion beam can remove material in a controlled way for cross-sectioning, sample preparation, and local modification.
Where it fits in the process flow
Applications
General reference — not yet source-verifiedA dual beam FIB-SEM is also used for cross-section imaging, sample lift-out, and targeted nanometer-scale editing of structures.
What do the numbers mean?
Power & electrical7
Vacuum & pumping2
Optics & imaging11
Configuration & options14
- Premium System[1]
- 200 / 208 / 230 Vac[1]
- Vacc- 0.5Kv - 30Kv[1]
- ZrO/W Schottky - Emission Electron Gun[1]
- Max Beam Current - >30nA[1]
- HV Tank(SE)[1]
- Electro Static Blanking System[1]
- Signal mixing for SE/BSE/ExB with user controlled electron energy detection biasing[1]
- 2560 X 1920 Image Memory[1]
- Dual Monitor Simultaneous Display[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationSingle Phase[1]
- Configuration50/60 Hz[1]
- ConfigurationSE Power Supply[1]
- Configuration(3) Vacuum System[1]
- PowerSingle Phase[2]
- Frequency50/60 Hz[2]
- Input voltage200 / 208 / 230 Vac[2]
- Pattern generator4K X 4K Pattern Generator System[1]
- Vacuum systemTurbo Molecular Pump; Dry Pump (250 I/s @60hz); Ion source chamber Ion pump (20 I/s); Getter Pump (100 l/s); Electron gun chamber Ion pump (30 l/s); Intermediate chamber Ion pump (30 l/s)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the NB 5000 Dual Beam FIB-SEM are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NB 5000 Dual Beam FIB-SEM are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NB 5000 Dual Beam FIB-SEM are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NB 5000 Dual Beam FIB-SEM are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NB 5000 Dual Beam FIB-SEM are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NB 5000 Dual Beam FIB-SEM is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Hitachi NB 5000 Dual Beam FIB-SEM family | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 10, 2026.
Compare with similar tools
View all →The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.
