Hitachi

CG5000

Research Quality: 40% complete

The Hitachi CG5000 is a CD-SEM inspection and metrology machine for wafers. The Hitachi CG5000 is designed for sub-22nm technology node and beyond. The Hitachi CG5000 is currently configured for 300mm.^[1]^[2]

Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

What it is

The Hitachi CG5000 is a CD-SEM used for critical dimension measurement in semiconductor manufacturing.^[2]^[1]

The Hitachi CG5000 is a metrology and inspection tool for wafers.^[2]^[1]

How it works

The CG5000 supports automatic calibration and long-term stability.^[1]

Where it fits in the process flow

The CG5000 is configured for wafer applications and supports process development for new materials and advanced process nodes.^[1]

Applications

The CG5000 is used for CD measurement on wafers.^[1]^[3]

The CG5000 is used for process development at advanced nodes and for measurement challenges associated with new process materials.^[1]

What do the numbers mean?

Power & electrical2

Electron Beam Voltage (Postdevelop L/S CD): 500 eV^[3]
Electron Beam Voltage (Postetch LCDU): 800 eV^[3]

Wafer handling4

Application: Applications for wafers^[1]
Configured wafer size: 300mm^[2]
Wafer Size: 300mm^[2]
Application: wafers^[1]

Optics & imaging2

Measurement characteristics: measurement, high-resolution, high-throughput^[1]
Performance: high-resolution, high-throughput, high-repeatability^[1]

Control & software1

Software Version: 58.52^[2]

Dimensions & facilities1

Measurement type: critical-dimension (CD) measurement^[2]

Configuration & options12

Date of Manufacture: 2014-05-01^[2]
Currently Configured for: 300mm^[2]
Tool current condition: Power on, not on production^[2]
Process: Scanning Defect^[2]
System Power Rating: 208 AC 1 Phase^[2]
Loading Configuration: 3 L/Ps^[2]
Technology: CD-SEM^[1]
Year(s): 2014^[2]
Year of Manufacture: 2014-05-01^[2]
Technology Node: sub-22nm^[1]
Measurement Type: CD-SEM^[2]
Calibration: enhanced automatic calibration^[1]

Observed configurations

How individual machines were equipped when they appeared on the secondary market — as listed, per unit. These describe one specific machine, not the model in general.

Unit as listed^[2]

300mm
System power rating 208 AC 1 phase
Loading Configuration: 3 L/Ps

Vintage & configurations

2014-05-01Date of manufacture^[2]
The Hitachi CG5000 has a stated date of manufacture of 2014-05-01.

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Electron Beam Voltage (Postdevelop L/S CD)500 eV^[3]
Electron Beam Voltage (Postetch LCDU)800 eV^[3]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the CG5000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented variants, configuration options, or revision breakpoints of the CG5000 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the CG5000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the CG5000 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the CG5000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the CG5000 are on record.
Answerable by: an OEM parts catalog or a service engineer