EV Group
6200 Infinity Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
The EV Group 6200 Infinity Mask aligns a photomask to a wafer or other substrate and then supports exposure in contact, proximity, or related alignment workflows.[4][5]
The EV Group 6200 NT platform supports top-side alignment, bottom-side alignment, IR alignment, bond alignment, and nanoimprint-related alignment modes.[4][5]
Where it fits in the process flow
The EV Group 6200 NT family is positioned for optical double-side lithography and for process flows that include thin resists, thick resists, deep cavities, fragile substrates, and compound semiconductor materials.[4]
Applications
The EV Group 6200 NT family supports optical double-side lithography, UV nanoimprint lithography, IR alignment, bond alignment, and processing of thin and fragile materials.[4][5]
The EV Group 6200 NT family is used for exposure of thin and thick resists, patterning of deep cavities and similar topographies, and processing of compound semiconductor substrates.[4]
What do the numbers mean?
Optics & imaging3
Configuration & options5
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer sizes does the EV Group 6200 NT support?
The EV Group 6200 NT supports substrate sizes up to 200 mm in the mask alignment configuration.[4]
What throughput does the EV Group 6200 NT provide?
The fully automated EV Group 6200 NT provides throughput up to 180 wafers per hour in first print mode and up to 140 wafers per hour in automatic alignment mode.[4]
What alignment modes are supported on the EV Group 6200 NT?
The EV Group 6200 NT supports top-side alignment, bottom-side alignment, IR alignment, bond alignment, and NIL alignment.[4]
What exposure sources does the EV Group 6200 NT use?
The EV Group 6200 NT uses a mercury light source or a UV LED light source.[4]
What process modes does the EV Group 6200 NT support?
The EV Group 6200 NT supports vacuum contact, hard contact, soft contact, proximity mode, and flex mode.[4]
Not publicly documented
The following facts about the 6200 Infinity Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 6200 Infinity Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 6200 Infinity Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 6200 Infinity Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 6200 Infinity Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 6200 Infinity Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Equipment inventory listing
- [3]Equipment inventory listing
- [4]EVG®6200 NT — evgroup.comevgroup.com
- [5]EVG®6200 NT — evgroup.comevgroup.com
Last updated Oct 3, 2026.
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