Denton Vacuum
EE-4
The Denton Vacuum EE-4 is an electron beam deposition tool. The Denton Vacuum EE-4 has a 6-position hearth. The Denton Vacuum EE-4 can accommodate up to five 3" diameter wafers.[1]
What it is
How it works
The EE-4 has a six-position hearth and rotating substrate holders. The tool automates deposition and pump-down or venting sequences with an onboard programmable logic controller.[1]
Where it fits in the process flow
Applications
The EE-4 is used for nanoscale films of non-magnetic metals in a vacuum environment.[1]
- Depositing nanoscale films of non-magnetic metals
What do the numbers mean?
Vacuum & pumping4
- Automation
- Depositions and pump-down/venting sequences are automated using an onboard PLC[1]
Wafer handling2
- Wafer capacity
- Up to five 3" diameter wafers; or three 4" wafers; or one 6" wafer; or multiple small samples/pieces of wafers[1]
Optics & imaging1
Configuration & options6
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the EE-4 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EE-4 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EE-4 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EE-4 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EE-4 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EE-4 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]cns1.rc.fas.harvard.edu — cns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
Last updated Oct 7, 2026.
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