CHA
Mark 40 Criterion Solution
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The CHA Mark 40 Criterion Solution is a vacuum deposition system. The CHA Mark 40 Criterion Solution appears under CHA Industries’ evaporation and sputtering products. The CHA Mark 40 Criterion Solution is part of CHA Industries’ product systems offering.[1]
Plate 01CHA Mark 40 E-Beam Evaporator Training Video
Georgia Tech IENWatch on YouTube
What it is
The CHA Mark 40 Criterion Solution is a vacuum deposition system in the Mark 40 product line.[1]
The Mark 40 Criterion Solution belongs to CHA Industries' evaporation and sputtering equipment family.[1]
How it works
General reference — not yet source-verifiedA vacuum deposition system forms thin films by placing a substrate in a low-pressure chamber and introducing material from a source so the material reaches the surface without normal atmospheric interference.
Deposition equipment of this class is used to build controlled coatings on substrates by evaporation or sputtering, with the chamber environment helping produce uniform film formation.
Where it fits in the process flow
General reference — not yet source-verifiedThe Mark 40 Criterion Solution sits in the thin-film formation portion of the fabrication flow, after substrate preparation and before later patterning or integration steps.
Vacuum deposition tools are used when a process needs to add conductive, dielectric, or functional layers to a wafer or other substrate before subsequent processing.
Applications
General reference — not yet source-verifiedVacuum deposition systems are used for thin-film coating tasks in microfabrication and related precision manufacturing.
Evaporation and sputtering systems are used to apply engineered films for electronic, optical, and other functional surfaces.
What do the numbers mean?
Vacuum & pumping1
Configuration & options1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- System typeVacuum deposition system[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Mark 40 Criterion Solution are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the Mark 40 Criterion Solution are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mark 40 Criterion Solution are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mark 40 Criterion Solution are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mark 40 Criterion Solution are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Mark 40 Criterion Solution are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]chaindustries.com — chaindustries.comchaindustries.com
Last updated Oct 5, 2026.
Compare with similar tools
View all →
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.
Applied Materials 0020 18455 is a part described as "Shaft, Rf In Local Match, Hdpcvd, Rev3."