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ASML

PAS 5500 100

LithographyASML PAS 5500 family
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What it is

The PAS 5500/100 is an i-line step-and-repeat lithography system, belonging to ASML's PAS 5500 family of wafer steppers. Steppers of this class project the image of a reticle onto a semiconductor wafer in a step-and-repeat manner, exposing one field at a time before stepping to the next field. The PAS 5500/100 was specifically designed for i-line (365 nm wavelength) lithography and was introduced as a solution for leading-edge volume production at the 0.40 micron technology node.[2]

How it works

The PAS 5500/100 is an i-line step-and-repeat (stepper) system, meaning it uses a projection lens to image a reticle pattern onto the wafer one field at a time. The wafer is mounted on a precision stage that steps between exposure fields. The system uses an i-line mercury arc lamp as its illumination source, producing light at 365 nm wavelength. Alignment is performed using alignment marks on the wafer, allowing accurate overlay between layers.[2]

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • Lens damage; needs replacement due to water leak.
  • Rust from water leak in the RH, LS sensor plat and near the stage.
  • About 20 parts swapped out for other use.
  • 6 missing boards.
  • Missing modules in the ARMS.
  • Lamp holder is missing.

What do the numbers mean?

Optics & imaging1

Lens damage, needs replacement due to water leak[1]
Accurate?

Configuration & options9

Rust from water leak in the RH, LS sensor plat and near the stage[1]
Accurate?
About 20 parts swapped out for other use[1]
Accurate?
6 missing boards[1]
Accurate?
Missing modules in the ARMS[1]
Accurate?
Lamp holder is missing[1]
Accurate?
Lithography type
Step-and-repeat i-line[2]
Accurate?
Technology node
0.40 µm[2]
Accurate?
Lithography type
Step & Repeat i-line[2]
Accurate?
Technology node
0.40 micron[2]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
PAS 5500/150i-line—Described as the successor to the PAS 5500/100 i-line system and optimized for high-volume semiconductor production.web.archive.org[2]
PAS 5500/100D———web.archive.org[2]
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What type of lithography system is the PAS 5500/100?

The PAS 5500/100 is an i-line step-and-repeat stepper.[2]

For what technology node was the PAS 5500/100 designed?

The PAS 5500/100 was introduced for the 0.40-micron technology node.[2]

Not publicly documented

The following facts about the PAS 5500 100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PAS 5500 100 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the PAS 5500 100 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the PAS 5500 100 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the PAS 5500 100 are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the PAS 5500 100 are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.org — asml.com (Jan 25, 2006)web.archive.org
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Last updated Oct 5, 2026.

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