ASML

PAS 2500

LithographyProduced 1985–ASML PAS 2500 family

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The ASML PAS 2500 is a wafer stepper series. The ASML PAS 2500/10 was the first lithography system developed entirely by ASML. The ASML PAS 2500/10 could image lines of 900 nanometers and place layers with an accuracy of 250 nanometers.^[1]^[2]

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Produced

1985–

Performance

250 nanometers^[2]

Optics

900 nm^[2]

What it is

The ASML PAS 2500 is a wafer stepper used in semiconductor lithography. The PAS 2500/10 variant, introduced in 1986, was the first lithography system developed entirely by ASML itself.^[2]

How it works

Reticle masking in the PAS 2500/40 uses four independent blades with full field travel.^[4]

Where it fits in the process flow

General reference — not yet source-verified

The PAS 2500 contributes to overlay accuracy by aligning each layer to the previous patterned layer on the wafer.

Applications

The machine is typically used in the fabrication of wafers up to 150 millimeters in diameter and can image linewidths of 900 nanometers, achieving a layer-to-layer overlay accuracy of 250 nanometers.^[2]

What do the numbers mean?

Wafer handling6

Wafer size (base model): 5 inches^[3]
Throughput (PAS 2500/10): 66 wafers per hour (150 mm)^[2]
Wafer size (PAS 2500/40): 150 mm (6 inches)^[4]
Wafer size: 5 inch^[3]
Wafer size: 150 mm/6"^[4]
Production capacity: 66 wafers of 150 millimeters per hour^[2]

Optics & imaging6

Resolution (PAS 2500/10): 900 nm^[2]
Overlay accuracy (PAS 2500/10): 250 nm^[2]
Reticle masking (PAS 2500/40): Four independent blades; full field of travel^[4]
Alignment system (PAS 2500/40): Dual automatic through-the-lens using diffraction grating marks directly referenced to reticle alignment system^[4]
Illumination system (PAS 2500/40): Elliptical mirror and fly's eye integrator^[4]
Position control (PAS 2500/40): Three axis HP laser interferometer system^[4]

Performance1

Layer placement accuracy: 250 nanometers^[2]

Dimensions & facilities1

Line width: 900 nanometers^[2]

Configuration & options1

Model: PAS 2500^[3]

Vintage & configurations

1985-06-30Production start^[1]
Introduction of the PAS 2500 series.
1985-06-30Introduction^[1]
The PAS 2500 series has a relevant date of 1985-06-30.
1986Machine year^[2]
The PAS 2500/10 is described as a machine from 1986.

Documented models & variants

Designation	Generation	Vintage	Changes	Source
PAS 2500/10	—	1986	First model in the PAS 2500 series; 150 mm wafer size; 900 nm resolution; 250 nm overlay accuracy; 66 wafers per hour throughput.	steendrukmuseum.nl^[2]
PAS 2500/40	—	—	150 mm wafer size; reticle masking with four independent blades; dual automatic through-the-lens alignment; elliptical mirror and fly's eye integrator illumination; three axis HP laser interferometer position control.	semistarcorp.com^[4]

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Not publicly documented

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Frequently asked questions

What wafer sizes does the ASML PAS 2500 support?

The ASML PAS 2500 supports 5-inch wafers, and the PAS 2500/40 model supports 150 mm / 6-inch wafers. The PAS 2500/10 variant also handles a maximum wafer size of 150 millimeters.^[3]^[4]^[2]

What is the resolution of the ASML PAS 2500/10?

The PAS 2500/10 can image lines of 900 nanometers.^[2]

What is the overlay accuracy of the ASML PAS 2500/10?

The PAS 2500/10 can place layers on top of each other with an accuracy of 250 nanometers.^[2]

What was the production capacity of the ASML PAS 2500/10?

The production capacity was a maximum of 66 wafers of 150 millimeters per hour.^[2]

What alignment system does the ASML PAS 2500/40 use?

The PAS 2500/40 uses a dual automatic through-the-lens alignment system using diffraction grating marks directly referenced to the reticle alignment system.^[4]

What was the historical significance of the ASML PAS 2500 series?

The PAS 2500 series was the system that made ASML into the company it is today, and led the way towards their 5500 series line. The PAS 2500/10 from 1986 was the first lithography system developed entirely by ASML itself.^[1]^[2]

Not publicly documented

The following facts about the PAS 2500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

The control-system platform and OS era of the PAS 2500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the PAS 2500 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the PAS 2500 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the PAS 2500 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the PAS 2500 are on record.
Answerable by: university cleanroom staff or an OEM application specialist