ASML
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A stepper exposes a wafer by projecting an image of a single die or a small field from a photomask through a reduction lens system onto a photoresist-coated wafer.
The wafer stage then steps to the next field position, and the exposure is repeated, building up the pattern across the entire wafer.
In the semiconductor fabrication process, steppers are used in the lithography step, which occurs after a wafer has been cleaned and coated with photoresist.
After exposure, the wafer moves to a developer station where the exposed photoresist is removed, followed by etching, deposition, or other processing steps for that layer.
Steppers of this class are used for patterning critical layers in integrated circuit manufacturing, such as transistor gates and interconnect levels.
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The following facts about the 60 100 200 Steppers are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the 60 100 200 Steppers are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 60 100 200 Steppers are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 60 100 200 Steppers are on record.
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The control-system platform and OS era of the 60 100 200 Steppers are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 60 100 200 Steppers are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Oct 9, 2026.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.