Applied Materials
VIISTA Trident XP Ion Implant
Applied Materials / Varian VIISTA Trident XP Ion Implant System is an ion implant system. Applied Materials / Varian VIISTA Trident XP Ion Implant System uses an XP beamline. Applied Materials / Varian VIISTA Trident XP Ion Implant System is configured with a standard process type.[1]
Power
OBIS 320FX w/ IS2000V(1) PSI[1]
Vacuum
Standard[1]
Gas delivery
XP-Standard Gas Box[1]
Optics
Laser - Belt drive 300mm[1]
What it is
The Applied Materials VIISTA Trident XP Ion Implant is an ion implantation system for semiconductor processing.[4]
The Applied Materials VIISTA Trident XP Ion Implant is configured with an XP beamline and a standard process type.[4][1]
How it works
The Applied Materials VIISTA Trident XP Ion Implant uses an XP beamline and a standard process type.[4]
Where it fits in the process flow
General reference — not yet source-verifiedThe Applied Materials VIISTA Trident XP Ion Implant sits in the wafer doping portion of semiconductor manufacturing.
Ion implantation is used after patterned films define exposed regions and before later thermal steps activate and redistribute implanted dopants.
Applications
The Applied Materials VIISTA Trident XP Ion Implant is used for semiconductor doping applications.[4]
What do the numbers mean?
Power & electrical3
Vacuum & pumping8
Wafer handling4
Gas & chemistry12
Optics & imaging1
Control & software3
Dimensions & facilities1
Configuration & options17
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Axcelis NV 8250— Same function class: Ion Implantation, UnknownCompare in depthsource[2]
- Axcelis NV 8250 HT Ion— Same function class: Ion Implantation, UnknownCompare in depthsource[3]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Differential pumpingStandard[1]
- Cryo PumpOBIS 320FX w/ IS2000V(1) PSI[1]
- Cryo Pump Facilities POCSS Cryo Exh UP-Rough. DN-Hel.DN[1]
- Frequency60 Hz Operation[1]
- Remote Harness Kit20M-Rem Harn/Heli-IS2000V[1]
- Roughing Pump SupplyCustomer Supplied Pumps Onsite[1]
- Rough Pump TypeEdwards iGX100MTi - iGX100L[1]
- Rough Pump ExhaustUniversal RP Exh - Floor[1]
- Turbo Pump SupplyCustomer Supplied Pumps Onsite[1]
- Turbo Pump TypePfeiffer HI-PACE 2300[1]
- Plasma Flood GunXP-Standard Gas Box[1]
- Gas Box10 Position[1]
- Gas Box Exhaust10 Stk GB Dual Exh FM4910 - Up[1]
- Gas Stick Slot 1HP Ar/N2 CGA 580[1]
- Gas Stick Slot 2PraxAir Boron VCR 1/4[1]
- Gas Stick Slot 3PraxAir Arsine[1]
- Gas Stick Slot 4PraxAir Phosphine - NSR[1]
- Gas Stick Slot 5Praxair CO[1]
- Gas Stick Slot 6PraxAir GeF4 - NSR[1]
- Gas Stick Slot 7Praxair Boron VCR 1/4[1]
- Gas Stick Slot 8XeH2[1]
- Gas Stick Slot 9HP N2 CGA 580[1]
- SS gaskets for all gas sticks10 stick gas box[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the VIISTA Trident XP Ion Implant are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VIISTA Trident XP Ion Implant are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the VIISTA Trident XP Ion Implant are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the VIISTA Trident XP Ion Implant are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the VIISTA Trident XP Ion Implant are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the VIISTA Trident XP Ion Implant is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Equipment inventory listing
- [3]Equipment inventory listing
- [4]VIISTA Trident XP Ion Implant — Applied Materials | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 10, 2026.
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The Axcelis NV 8250 is an ion implanter for 8-inch wafer processing with an energy range of 0-250 keV.
Axcelis NV 8250 HT Ion Implanter is an 8-inch ion implanter with listed power and vacuum-related configuration details.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
