Applied Materials

HEXP VIISta HE

Ion Implantation Applied Materials HEXP VIISta HE family

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Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Power

60 Hz Operation^[2]

Vacuum

320FE CRYO OBIS,6^[2]

What it is

The Applied Materials HEXP VIISta HE is an ion implantation tool.^[2]

How it works

General reference — not yet source-verified

An ion implanter accelerates dopant ions and directs them into a wafer surface to change the wafer's electrical properties.

Ion implantation tools generally use a vacuum chamber, a beam delivery path, wafer handling stages, and gas or source hardware to control the implant condition.

Where it fits in the process flow

General reference — not yet source-verified

The HEXP VIISta HE belongs in the doping sequence of semiconductor manufacturing.

Ion implantation is typically used after pattern definition steps and before thermal processing that activates implanted dopants and repairs implantation damage.

What do the numbers mean?

Power & electrical1

Frequency: 60 Hz Operation^[2]

Vacuum & pumping6

Cryo Pump: 320FE CRYO OBIS,6^[2]
Cryo Pump Exhaust: SS Cryo Exhaust Through Roof^[2]
Cryo Compressor: IS-1000 KPa X 3^[2]
RP3 Exhaust: RP3 PVC Exhaust Line - Roof^[2]
Roughing Pump Supply: Customer Supplied Pumps Onsite^[1]
Turbo Pump Supply: VSE Supplied Pumps^[1]

Wafer handling4

Load Lock Vent: 500 Load LockVent Std Finish^[2]
Load Lock Vent Connection: 500 Vent Con Std Finish^[2]
Wafer Size: 8 inch (200mm)^[1]
Wafer Handler Side Window Kit: Windows^[1]

Control & software1

VCS Software Package: VCS 9.XX (Specify revision)^[1]

Dimensions & facilities1

Facilities: Faci fr Botm(Air-N2-H2O-Power)^[2]

Configuration & options15

Includes:^[1]
Chiller: SMC remote 20M^[1]
Dosimetry: Advanced^[1]
Label Kit: English^[1]
Manometer: Triple Manometer 0-1 kPa^[1]; NSR - Roplat/Tilter^[1]; NSR - Platen Type 200mm SiC^[1]; NSR - Pick and Pad Type^[1]
Power Kit: Standard Power Kit^[1]
Profiler: Standard Rack and Pinion^[1]
Remote Harness Kit: 20M Rem Facilites Kit - Floor^[1]; NSR - Source SiC^[1]
Platen Type: 200mm SiC^[1]
Source Material: SiC^[1]
UPS/CVCF: Standard UPS 3KVA - No CVCF^[1]

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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

Axcelis NV 8250— Same function class: Ion Implantation, UnknownCompare in depthsource^[3]
Axcelis NV 8250 HT Ion— Same function class: Ion Implantation, UnknownCompare in depthsource^[4]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Cryo Pump320FE CRYO OBIS,6^[2]
Cryo Pump ExhaustSS Cryo Exhaust Through Roof^[2]
Cryo CompressorIS-1000 KPa X 3^[2]
Frequency60 Hz Operation^[2]
RP3 ExhaustRP3 PVC Exhaust Line - Roof^[2]
Roughing Pump SupplyCustomer Supplied Pumps Onsite^[1]
Turbo Pump SupplyVSE Supplied Pumps^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What process class is the Applied Materials HEXP VIISta HE?

The Applied Materials HEXP VIISta HE is an ion implantation tool.^[2]

Not publicly documented

The following facts about the HEXP VIISta HE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the HEXP VIISta HE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the HEXP VIISta HE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the HEXP VIISta HE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the HEXP VIISta HE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the HEXP VIISta HE is not on record.
Answerable by: an OEM datasheet or a fab qualification report