Applied Materials
Centura 5200 RTP Reactor
The Applied Materials Centura 5200 is a rapid thermal process (RTP) reactor. The Applied Materials Centura 5200 uses a standard system controller and operates on 208 VAC, 3-phase power. The Applied Materials Centura 5200 is Y2k compliant and features a UHP gas panel.[1]
What it is
The Applied Materials Centura 5200 is a rapid thermal processing (RTP) reactor designed for single-wafer thermal treatment in semiconductor manufacturing. The system is configured as a single-chamber unit and operates on 208 VAC three-phase power. The Centura 5200 uses an Ebara A30 loadlock pump and is equipped with a UHP-grade (ultra-high purity) gas panel. The system is Y2K compliant and uses a standard system controller.[1]
How it works
General reference — not yet source-verifiedRapid thermal processing reactors heat a single wafer to high temperatures using arrays of tungsten-halogen lamps or other radiant heat sources. The wafer is rapidly brought to the target temperature, held for a short duration (typically seconds), and then cooled quickly. Temperature uniformity is maintained through real-time pyrometry and closed-loop lamp power control inside a cold-wall quartz chamber.
Where it fits in the process flow
General reference — not yet source-verifiedThe Centura 5200 RTP reactor is used in front-end-of-line (FEOL) and back-end-of-line (BEOL) process flows. In FEOL, it is typically placed after ion implantation to activate dopants and repair crystalline damage. In BEOL, it can be used for silicide formation (e.g., nickel or cobalt silicide) and for annealing of high-k dielectrics or metal gates.
What do the numbers mean?
Power & electrical2
Vacuum & pumping2
Gas & chemistry2
Control & software1
Configuration & options6
Observed configurations
How individual machines were equipped when they appeared on the secondary market — as listed, per unit. These describe one specific machine, not the model in general.
Unit as listed[1]
- 1 Ch
- 208 VAC, 3 Phase
- System Controller: Standard
- Fab installation: TTW
- System Umbilicals: 25 ft
- Y 2k Compliant
- Loadlock Pump: Ebara
- Pump Size: A30
- I/O Slit Valve Type: Viton
- Gas Panel Purity: UHP
- Gas Panel Type: Standard
- OTF Certified
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Centura 5200 RTP Reactor are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura 5200 RTP Reactor are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura 5200 RTP Reactor are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura 5200 RTP Reactor are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura 5200 RTP Reactor are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura 5200 RTP Reactor is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Inventory photo
Last updated Sep 24, 2026.
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