Manufacturer
Tystar
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6 entries
- Tytan 1600 LPCVDTystar
The Tystar Tytan 1600 LPCVD is a low pressure chemical vapor deposition system.
CategoryDeposition - 3600Tystar
The Tystar 3600 is an LPCVD deposition system.
CategoryDeposition - Bank2Tystar
The Tystar Bank2 is a chemical vapor deposition (CVD) system used for depositing TEOS-based silicon dioxide films.
CategoryDeposition - Mini Tytan 4600Tystar
The Tystar Mini-Tytan 4600 Furnace system is designed for diffusion, oxidation, and LPCVD applications.
CategoryThermal / DiffusionWafer50mm - 8300Tystar
The Tystar 8300 is a tube furnace used for thermal processing, including oxidation, annealing, and spin-on glass curing.
CategoryThermal Process - PVD1000TystarCategoryDeposition
