Waferpedia

Tool family

Tegal 6500 HRe-

TegalEtch1 entry

The Tegal 6500 HRe- is a dual-frequency etch system series for plasma etching. The Tegal 6500 HRe- uses high-density, capacitively coupled plasma generation and magnetic plasma confinement for precise etching down to the sub-micron level.

Models in this family

  1. The Tegal 6500 HRe- is a dual-frequency etch system series for plasma etching. The Tegal 6500 HRe- uses high-density, capacitively coupled plasma generation and magnetic plasma confinement for precise etching down to the sub-micron level.

    Cited variants

    DesignationGenerationVintageChangesSource
    6510——Capable of gate etching in polysilicon and shallow trench isolation; can etch features as small as 90 nm on nitride and oxide hard masks.plasmatherm.com[1]
    6520——Can etch aluminum alloys down to the sub-micron level; includes a rinse-strip-rinse procedure; useful for aluminum alloy interconnects and metallization layers; can anisotropically etch thick layers greater than 2 microns.plasmatherm.com[1]
    6540——Designed for high dielectric coefficient materials, platinum and iridium electrodes, gold interconnects, and other difficult-to-etch materials including PZT, SBT, and BST; features as small as 90 nm can be etched.plasmatherm.com[1]

Sources

Sources (1)Every fact above is drawn from these public sources
  1. [1]plasmatherm.complasmatherm.com