Comparison ledger
SUSS MicroTec DSC300 Gen2, SUSS MicroTec MA300 Gen2, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | DSC300 Gen2SUSS MicroTec | MA300 Gen2SUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | 300mm | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | Gen2 | Gen2 |
| Family | SUSS MicroTec DSC300 Gen2 | SUSS MicroTec MA300 Gen2 |
| Specifications | ||
| Type | Automated system[1] | Proximity exposure[1] |
| Wafer size | up to 300 mm[1] | 300 mm[1] |
| Process category | Projection lithography[1] | — |
| Exposure technology | Full-field scanning projection[1] | — |
| Alignment | Yes[1] | — |
| Automation | — | Automated system[1] |
| Generation | — | Gen2[1] |
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