Waferpedia

Comparison ledger

421 Spray Solventversus1000P

Semitool 421 Spray Solvent, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMSemitoolYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer sizeBatch Solvent Processor for Wafer Cleaning—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilySemitool 421YES 1000P
Cited variants—
Specifications
Process ApplicationsPolymer Removal, Resist Stripping, Wafer Cleaning, Metal Lift-Off[2]—
Wafer sizeBatch Solvent Processor for Wafer Cleaning[2]—
Max Wafer Size8"/200mm Wafers[2]—
ConfigurationSingle Chamber[2]Parallel plate[5]
Chamber TypeSingle Chamber[2]—
Number of Tanks4[2]—
Heated Tanks2[2]—
Ambient Tanks2[2]—
Rotor Included1[2]—
Max Wafers per Batch50 wafers[3]—
Vintage2004[2]—
Wafer Size200 mm[1]—
Model—1000P[4]
System type—Plasma cleaning system[4]
Shelf configuration—Four 16 x 16 inch shelves[4]
Total capacity—1024 square inches[4]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[4]
Number of shelves—4[4]
Shelf size—16 x 16 inches[4]
Power—1000 W[5]
Operation modes—Active, RIE, Downstream[4]
Sample size range—From smallest semiconductor chip to large flat panels[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]hfsemi.comhfsemi.com
  2. [2]inventory listing
  3. [3]classoneequipment.comclassoneequipment.com
  4. [4]web.archive.orgweb.archive.org
  5. [5]semistarcorp.comsemistarcorp.com