Comparison ledger
Oxford Instruments 100 ICP Fluorine, Tokyo Electron SCCM Shin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 ICP FluorineOxford Instruments | SCCM ShinTokyo Electron |
|---|---|---|
| OEM | Oxford Instruments | Tokyo Electron |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments 100 ICP Fluorine | Tokyo Electron SCCM Shin |
| Specifications | ||
| Etch Gases | SF6, CF4, O2, Ar, N2, CHF3, C4F8[1] | — |
| Cryo DRIE etch rate | up to 5 µm/min[1] | — |
| Wafer size | 4 inch, 6 inch, 8 inch (with clamp change)[1] | — |
| OEM | — | Tokyo Electron[2] |
| Model | — | SCCM Shin[2] |
| Category | — | Etch[3] |
| Vintage | — | 2005[2] |
| Description | — | Oxide etcher with qty 3 chambers[4] |
| Version | — | 300 mm[4] |
| Tool type | — | TSP-30555SSS[4] |
| Load ports | — | 3[4] |
| Etch process chambers | — | 3[4] |
| RF generator (top) | — | Daihen AGA-50B 60 MHz 5 kW[4] |
| RF generator (bottom) | — | Daihen WGA-50E 2 MHz 5 kW[4] |
| Other chamber component | — | Daihen DGP-120A2[4] |
| Gate valves | — | Vat gate valves[4] |
| Vacuum pumps | — | Shimadzu turbo pumps[4] |
| DC power supplies | — | Kyosan DC power supplies[4] |
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